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Title: Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films

Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf 1-xZr xO 2) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm -2K -1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, 1).
Authors:
 [1] ; ORCiD logo [1] ;  [1] ;  [1] ;  [1] ;  [1]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Report Number(s):
SAND-2017-2871J
Journal ID: ISSN 0003-6951; 651794
Grant/Contract Number:
AC04-94AL85000
Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 110; Journal Issue: 7; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Pyroelectricity; Polarization; Electric measurements; Ferroelectric materials; Plasma etching
OSTI Identifier:
1356224

Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., and Ihlefeld, J. F.. Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films. United States: N. p., Web. doi:10.1063/1.4976519.
Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., & Ihlefeld, J. F.. Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films. United States. doi:10.1063/1.4976519.
Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., and Ihlefeld, J. F.. 2017. "Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films". United States. doi:10.1063/1.4976519. https://www.osti.gov/servlets/purl/1356224.
@article{osti_1356224,
title = {Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films},
author = {Smith, S. W. and Kitahara, A. R. and Rodriguez, M. A. and Henry, M. D. and Brumbach, M. T. and Ihlefeld, J. F.},
abstractNote = {Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm-2K-1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, 1).},
doi = {10.1063/1.4976519},
journal = {Applied Physics Letters},
number = 7,
volume = 110,
place = {United States},
year = {2017},
month = {2}
}

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