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Title: Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films

Abstract

Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf 1-xZr xO 2) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm -2K -1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, 1).

Authors:
 [1]; ORCiD logo [1];  [1];  [1];  [1];  [1]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1356224
Report Number(s):
SAND-2017-2871J
Journal ID: ISSN 0003-6951; 651794
Grant/Contract Number:  
AC04-94AL85000
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 110; Journal Issue: 7; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Pyroelectricity; Polarization; Electric measurements; Ferroelectric materials; Plasma etching

Citation Formats

Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., and Ihlefeld, J. F. Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films. United States: N. p., 2017. Web. doi:10.1063/1.4976519.
Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., & Ihlefeld, J. F. Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films. United States. doi:10.1063/1.4976519.
Smith, S. W., Kitahara, A. R., Rodriguez, M. A., Henry, M. D., Brumbach, M. T., and Ihlefeld, J. F. Mon . "Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films". United States. doi:10.1063/1.4976519. https://www.osti.gov/servlets/purl/1356224.
@article{osti_1356224,
title = {Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films},
author = {Smith, S. W. and Kitahara, A. R. and Rodriguez, M. A. and Henry, M. D. and Brumbach, M. T. and Ihlefeld, J. F.},
abstractNote = {Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm-2K-1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, 1).},
doi = {10.1063/1.4976519},
journal = {Applied Physics Letters},
number = 7,
volume = 110,
place = {United States},
year = {2017},
month = {2}
}

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