Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films

Smith, S. W.; Kitahara, A. R.; Rodriguez, M. A.; Henry, M. D.; Brumbach, M. T.; Ihlefeld, J. F.

doi:10.1063/1.4976519

Title: Pyroelectric response in crystalline hafnium zirconium oxide (Hf _1- _x Zr _x O ₂ ) thin films

Journal Article · 13 February 2017 · Applied Physics Letters

DOI: https://doi.org/10.1063/1.4976519 · OSTI ID:1356224

Smith, S. W. ^[1];

^[1]; Rodriguez, M. A. ^[1]; Henry, M. D. ^[1]; Brumbach, M. T. ^[1]; Ihlefeld, J. F. ^[1]

Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf_1-xZr_xO₂) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm^-2K^-1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, 1).

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Research Organization:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC04-94AL85000; AC04- 94AL85000

OSTI ID:: 1356224

Alternate ID(s):: OSTI ID: 1985572

Report Number(s):: SAND-2017-2871J; 651794

Journal Information:: Applied Physics Letters, Vol. 110, Issue 7; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
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Title: Pyroelectric response in crystalline hafnium zirconium oxide (Hf 1- x Zr x O 2 ) thin films

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Title: Pyroelectric response in crystalline hafnium zirconium oxide (Hf _1- _x Zr _x O ₂ ) thin films