Toward clean suspended CVD graphene

Yulaev, Alexander; Cheng, Guangjun; Hight Walker, Angela R.; Vlassiouk, Ivan V.; Myers, Alline; Leite, Marina S.; Kolmakov, Andrei

doi:10.1039/C6RA17360H

Title: Toward clean suspended CVD graphene

Journal Article · Fri Aug 26 00:00:00 EDT 2016 · RSC Advances

DOI: https://doi.org/10.1039/C6RA17360H · OSTI ID:1344290

Yulaev, Alexander ^[1]; Cheng, Guangjun ^[1]; Hight Walker, Angela R. ^[1]; Vlassiouk, Ivan V. ^[2]; Myers, Alline ^[1]; Leite, Marina S. ^[3]; Kolmakov, Andrei ^[1]

National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Univ. of Maryland, College Park, MD (United States)

The application of suspended graphene as electron transparent supporting media in electron microscopy, vacuum electronics, and micromechanical devices requires the least destructive and maximally clean transfer from their original growth substrate to the target of interest. Here, we use thermally evaporated anthracene films as the sacrificial layer for graphene transfer onto an arbitrary substrate. We show that clean suspended graphene can be achieved via desorbing the anthracene layer at temperatures in the 100 °C to 150 °C range, followed by two sequential annealing steps for the final cleaning, using a Pt catalyst and activated carbon. The cleanliness of the suspended graphene membranes was analyzed employing the high surface sensitivity of low energy scanning electron microscopy and X-ray photoelectron spectroscopy. A quantitative comparison with two other commonly used transfer methods revealed the superiority of the anthracene approach to obtain a larger area of clean, suspended CVD graphene. Lastly, our graphene transfer method based on anthracene paves the way for integrating cleaner graphene in various types of complex devices, including the ones that are heat and humidity sensitive.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1344290

Journal Information:: RSC Advances, Journal Name: RSC Advances Journal Issue: 87 Vol. 6; ISSN 2046-2069; ISSN RSCACL

Publisher:: Royal Society of ChemistryCopyright Statement

Country of Publication:: United States

Language:: English

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Cited By (2)

Cleaning graphene: Comparing heat treatments in air and in vacuum: Cleaning graphene Tripathi, Mukesh; Mittelberger, Andreas; Mustonen, Kimmo physica status solidi (RRL) - Rapid Research Letters, Vol. 11, Issue 8 https://doi.org/10.1002/pssr.201700124	journal	July 2017
Capacitive pressure sensing with suspended graphene–polymer heterostructure membranes Berger, Christian; Phillips, Rory; Centeno, Alba Nanoscale, Vol. 9, Issue 44 https://doi.org/10.1039/c7nr04621a	journal	January 2017

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