Recent applications of hard x-ray photoelectron spectroscopy

Journal Article · Thu May 05 04:00:00 UTC 2016 · Journal of Vacuum Science and Technology A

DOI: https://doi.org/10.1116/1.4946046 · OSTI ID:1340393

Weiland, Conan ^[1]; Rumaiz, Abdul K. ^[2]; Pianetta, Piero ^[3]; Woicik, Joseph C. ^[1]

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1. National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States)
2. Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)
3. SLAC National Accelerator Lab., Menlo Park, CA (United States)

Recent applications of hard x-ray photoelectron spectroscopy (HAXPES) demonstrate its many capabilities in addition to several of its limitations. Examples are given, including measurement of buried interfaces and materials under in-situ or in-operando conditions, as well as measurements under x-ray standing-wave and resonant excitation. We also present physical considerations that differentiate HAXPES from photoemission measurements utilizing soft and ultraviolet x rays.

• Research Organization: Brookhaven National Laboratory (BNL), Upton, NY (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
• Grant/Contract Number: SC0012704
• OSTI ID: 1340393
• Report Number(s): BNL--112623-2016-JA
• Journal Information: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 3 Vol. 34; ISSN 0734-2101
• Publisher: American Vacuum SocietyCopyright Statement
• Country of Publication: United States
• Language: English