VUV and XUV reflectance of optically coated mirrors for selection of high harmonics

Journal Article · Mon Aug 08 00:00:00 EDT 2016 · Optics Express

DOI: https://doi.org/10.1364/OE.24.018209 · OSTI ID:1313072

Larsen, K. A. ^[1]; Cryan, J. P. ^[2]; Shivaram, N. ^[3]; Champenois, E. G. ^[1]; Wright, T. W. ^[4]; Ray, D. ^[2]; Kostko, O. ^[3]; Ahmed, M. ^[3]; Belkacem, A. ^[3]; Slaughter, D. S. ^[3]

---

1. Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); SLAC National Accelerator Lab., Menlo Park, CA (United States)
3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of California, Davis, CA (United States)

We report the reflectance, ~1° from normal incidence, of six different mirrors as a function of photon energy, using monochromatic vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) radiation with energies between 7.5 eV and 24.5 eV. The mirrors examined included both single and multilayer optical coatings, as well as an uncoated substrate. Furthermore, we discuss the performance of each mirror, paying particular attention to the potential application of suppression and selection of high-order harmonics of a Ti:sapphire laser.

• Research Organization: SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Workforce Development for Teachers and Scientists (WDTS) (SC-27)
• Grant/Contract Number: AC02-05CH11231
• OSTI ID: 1313072
• Journal Information: Optics Express, Journal Name: Optics Express Journal Issue: 16 Vol. 24; ISSN 1094-4087; ISSN OPEXFF
• Publisher: Optical Society of America (OSA)Copyright Statement
• Country of Publication: United States
• Language: English