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Title: Stopping power measurements with the Time-of-Flight (ToF) technique

Abstract

In our review of measurements of the stopping power of ions in matter is presented along with new measurements of the stopping powers of O, Si, Ti, and Au ions in self-supporting thin foils of SiO2, Nb2O5, and Ta2O5. Moreover, a Time-of-Flight system at the Ion Beam Materials Laboratory at the University of Tennessee, Knoxville, was used in transmission geometry in order to reduce experimental uncertainties. Finally, the resulting stopping powers show good precision and accuracy and corroborate previously quoted values in the literature. New stopping data are determined.

Authors:
 [1];  [2];  [2];  [2];  [2];  [3];  [3]
+ Show Author Affiliations
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  2. Univ. of Tennessee, Knoxville, TN (United States)
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States)
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1265866
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Accepted Manuscript
Journal Name:
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Additional Journal Information:
Journal Volume: 366; Journal Issue: C; Journal ID: ISSN 0168-583X
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; stopping power; time-of-flight; elastic recoil detection analysis; ion beam analysis; energy loss

Citation Formats

Fontana, Cristiano L., Chen, Chien-Hung, Crespillo, Miguel L., Graham, Joseph T., Xue, Haizhou, Zhang, Yanwen, and Weber, William J. Stopping power measurements with the Time-of-Flight (ToF) technique. United States: N. p., 2015. Web. doi:10.1016/j.nimb.2015.10.048.
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Fontana, Cristiano L., Chen, Chien-Hung, Crespillo, Miguel L., Graham, Joseph T., Xue, Haizhou, Zhang, Yanwen, & Weber, William J. Stopping power measurements with the Time-of-Flight (ToF) technique. United States. https://doi.org/10.1016/j.nimb.2015.10.048
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Fontana, Cristiano L., Chen, Chien-Hung, Crespillo, Miguel L., Graham, Joseph T., Xue, Haizhou, Zhang, Yanwen, and Weber, William J. Tue . "Stopping power measurements with the Time-of-Flight (ToF) technique". United States. https://doi.org/10.1016/j.nimb.2015.10.048. https://www.osti.gov/servlets/purl/1265866.
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@article{osti_1265866,
title = {Stopping power measurements with the Time-of-Flight (ToF) technique},
author = {Fontana, Cristiano L. and Chen, Chien-Hung and Crespillo, Miguel L. and Graham, Joseph T. and Xue, Haizhou and Zhang, Yanwen and Weber, William J.},
abstractNote = {In our review of measurements of the stopping power of ions in matter is presented along with new measurements of the stopping powers of O, Si, Ti, and Au ions in self-supporting thin foils of SiO2, Nb2O5, and Ta2O5. Moreover, a Time-of-Flight system at the Ion Beam Materials Laboratory at the University of Tennessee, Knoxville, was used in transmission geometry in order to reduce experimental uncertainties. Finally, the resulting stopping powers show good precision and accuracy and corroborate previously quoted values in the literature. New stopping data are determined.},
doi = {10.1016/j.nimb.2015.10.048},
journal = {Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms},
number = C,
volume = 366,
place = {United States},
year = {Tue Nov 10 00:00:00 EST 2015},
month = {Tue Nov 10 00:00:00 EST 2015}
}
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Stopping power of C, O and Cl in tantalum oxide
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New experimental molecular stopping cross section data of Al2O3, for heavy ions
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New ion beam materials laboratory for materials modification and irradiation effects research
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journal, May 2002

  • Zhang, Yanwen; Possnert, Göran
  • Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 190, Issue 1-4
  • DOI: 10.1016/s0168-583x(01)01239-3
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    Round‐robin test of medium‐energy ion scattering for quantitative depth profiling of ultrathin HfO 2 /SiO 2 /Si films
    journal, April 2019

    • Min, Won Ja; Marmitt, Gabriel; Grande, Pedro L.
    • Surface and Interface Analysis, Vol. 51, Issue 7
    • DOI: 10.1002/sia.6642
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