skip to main content

DOE PAGESDOE PAGES

Title: Cr/B 4C multilayer mirrors: Study of interfaces and X-ray reflectance

Here, we present an experimental study of the effect of layer interfaces on the x-ray reflectance in Cr/B 4C multilayer interference coatings with layer thicknesses ranging from 0.7 nm to 5.4 nm. The multilayers were deposited by magnetron sputtering and by ion beam sputtering. Grazing incidence x-ray reflectometry, soft x-ray reflectometry, and transmission electron microscopy reveal asymmetric multilayer structures with a larger B 4C-on-Cr interface, which we modeled with a 1–1.5 nm thick interfacial layer. Reflectance measurements in the vicinity of the Cr L 2,3 absorption edge demonstrate fine structure that is not predicted by simulations using the currently tabulated refractive index (optical constants) values for Cr.
Authors:
 [1] ;  [2] ;  [3] ;  [3] ;  [3] ;  [4] ;  [1] ;  [3] ;  [1] ;  [1] ;  [1]
  1. Univ. Paris-Saclay, Palaiseau Cedex (France). Inst. of Optics and Charles Fabry Lab.
  2. Univ. Paris-Saclay, Palaiseau Cedex (France). Inst. of Optics and Charles Fabry Lab.; Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  3. Synchrotron SOLEIL, Gif sur Yvette Cedex (France)
  4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Center for X-ray Optics
Publication Date:
Report Number(s):
LLNL-JRNL-680905
Journal ID: ISSN 0021-8979; JAPIAU
Grant/Contract Number:
AC52-07NA27344; ANR-11-EQPX-0029; ANR-10-LABX-0039; AC03-76F00098; AC02-05CH11231
Type:
Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 119; Journal Issue: 12; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org:
USDOE; EAG Lab., San Diego, CA (United States); French National Research Agency (ANR)
Country of Publication:
United States
Language:
English
Subject:
74 ATOMIC AND MOLECULAR PHYSICS; 36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Multilayers; Photons; Transmission electron microscopy; Mirrors; Optical constants; Chemical interdiffusion; Ion beam assisted deposition; Sputter deposition; Computer modeling; Soft X-rays
OSTI Identifier:
1260484
Alternate Identifier(s):
OSTI ID: 1243148; OSTI ID: 1440923