Measurement of optical scattered power from laser-induced shallow pits on silica
Abstract
We describe a model for far-field scattered power and irradiance by a silica glass slab with a shallow-pitted exit surface and is experimentally validated. The comparison to the model is performed using a precisely micromachined ensemble of ~11 μm wide laser ablated shallow pits producing 1% of the incident beam scatter in a 10 mrad angle. This series of samples with damage initiations and laser-induced shallow pits resulting from 351 nm, 5 ns pulsed laser cleaning of metal microparticles at different fluences between 2 J/cm2 and 11 J/cm2 are characterized as well and found in good agreement with model predictions.
- Authors:
-
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1242003
- Alternate Identifier(s):
- OSTI ID: 1222422
- Report Number(s):
- LLNL-JRNL-673988
Journal ID: ISSN 0003-6935; APOPAI
- Grant/Contract Number:
- AC52-07NA27344; 14-ERD-098
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Optics
- Additional Journal Information:
- Journal Volume: 54; Journal Issue: 28; Journal ID: ISSN 0003-6935
- Publisher:
- Optical Society of America (OSA)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS
Citation Formats
Feigenbaum, Eyal, Nielsen, Norman, and Matthews, Manyalibo J. Measurement of optical scattered power from laser-induced shallow pits on silica. United States: N. p., 2015.
Web. doi:10.1364/AO.54.008554.
Feigenbaum, Eyal, Nielsen, Norman, & Matthews, Manyalibo J. Measurement of optical scattered power from laser-induced shallow pits on silica. United States. https://doi.org/10.1364/AO.54.008554
Feigenbaum, Eyal, Nielsen, Norman, and Matthews, Manyalibo J. Thu .
"Measurement of optical scattered power from laser-induced shallow pits on silica". United States. https://doi.org/10.1364/AO.54.008554. https://www.osti.gov/servlets/purl/1242003.
@article{osti_1242003,
title = {Measurement of optical scattered power from laser-induced shallow pits on silica},
author = {Feigenbaum, Eyal and Nielsen, Norman and Matthews, Manyalibo J.},
abstractNote = {We describe a model for far-field scattered power and irradiance by a silica glass slab with a shallow-pitted exit surface and is experimentally validated. The comparison to the model is performed using a precisely micromachined ensemble of ~11 μm wide laser ablated shallow pits producing 1% of the incident beam scatter in a 10 mrad angle. This series of samples with damage initiations and laser-induced shallow pits resulting from 351 nm, 5 ns pulsed laser cleaning of metal microparticles at different fluences between 2 J/cm2 and 11 J/cm2 are characterized as well and found in good agreement with model predictions.},
doi = {10.1364/AO.54.008554},
journal = {Applied Optics},
number = 28,
volume = 54,
place = {United States},
year = {Thu Oct 01 00:00:00 EDT 2015},
month = {Thu Oct 01 00:00:00 EDT 2015}
}
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