Structure of n-alkyltrichlorosilane mono layers on Si(100)/SiO2

Ocko, B.; Will, J.; Magerl, A.

doi:10.1021/acs.langmuir.5b03091

Title: Structure of n-alkyltrichlorosilane mono layers on Si(100)/SiO₂

Journal Article · Mon Oct 05 00:00:00 UTC 2015 · Langmuir

DOI: https://doi.org/10.1021/acs.langmuir.5b03091 · OSTI ID:1240699

Ocko, B. ^[1]; Will, J. ^[2]; Magerl, A. ^[2]

Brookhaven National Lab. (BNL), Upton, NY (United States)
Friedrich-Alexander-Univ Erlangen-Nurnberg, Erlangen (Germany)

The structure of n-alkyltrichlorosilane self-assembled monolayers (SAMs) of alkyl chain lengths n = 12, 14, 18, and 22 formed on the amorphous native oxide of silicon (100) has been investigated via angstrom-resolution surface X-ray scattering techniques, with particular focus on the proliferation of lateral order along the molecules’ long axis. Grazing incidence diffraction shows that the monolayer is composed of hexagonally packed crystalline-like domains for n = 14, 18, and 22 with a lateral size of about 60 Å. However, Bragg rod analysis shows that ~12 of the CH₂ units are not included in the crystalline-like domains. We assign this, and the limited lateral crystallites’ size, to strain induced by the size mismatch between the optimal chain–chain and headgroup–headgroup spacings. Lastly, analysis of X-ray reflectivity profiles for n = 12, 14, and 22 shows that the density profile used to successfully model n = 18 provides an excellent fit where the analysis-derived parameters provide complementary structural information to the grazing incidence results.

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Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

OSTI ID:: 1240699

Report Number(s):: BNL--111848-2016-JA; KC0203010

Journal Information:: Langmuir, Journal Name: Langmuir Journal Issue: 43 Vol. 31; ISSN 0743-7463

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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