Carbon p electron ferromagnetism in silicon carbide
- Helmholtz-Zentrum Dresden-Rossendorf, Dresden (Germany); Technische Univ. Dresden, Dresden (Germany)
- Helmholtz-Zentrum Dresden-Rossendorf, Dresden (Germany); Chinese Academy of Sciences, Beijing (China)
- Chinese Academy of Sciences, Beijing (China)
- Helmholtz-Zentrum Dresden-Rossendorf, Dresden (Germany)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Technische Univ. Chemnitz, Chemnitz (Germany)
- Helmholtz-Zentrum Dresden-Rossendorf, Dresden (Germany); Technische Univ. Chemnitz, Chemnitz (Germany)
Ferromagnetism can occur in wide-band gap semiconductors as well as in carbon-based materials when specific defects are introduced. It is thus desirable to establish a direct relation between the defects and the resulting ferromagnetism. Here, we contribute to revealing the origin of defect-induced ferromagnetism using SiC as a prototypical example. We show that the long-range ferromagnetic coupling can be attributed to the p electrons of the nearest-neighbor carbon atoms around the VSiVC divacancies. Thus, the ferromagnetism is traced down to its microscopic electronic origin.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-05CH11231
- OSTI ID:
- 1201546
- Journal Information:
- Scientific Reports, Journal Name: Scientific Reports Vol. 5; ISSN 2045-2322
- Publisher:
- Nature Publishing GroupCopyright Statement
- Country of Publication:
- United States
- Language:
- English
| Defect-induced magnetism in SiC 
 | journal | July 2019 | 
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