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Title: Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO 2 Films

Abstract

Amorphous TiO 2 thin films were radio frequency sputtered onto siliconmonoxide and carbon support films on molybdenum transmission electron microscope (TEM) grids and observed during in situ annealing in a TEM heating stage at 250 C. The evolution of crystallization is consistent with a classical model of homogeneous nucleation and isotropic grain growth. The two-dimensional grain morphology of the TEM foil allowed straightforward recognition of amorphous and crystallized regions of the films, for measurement of crystalline volume fraction and grain number density. By assuming that the kinetic parameters remain constant beyond the onset of crystallization, the final average grain size was computed, using an analytical extrapolation to the fully crystallized state. Electron diffraction reveals a predominance of the anatase crystallographic phase.

Authors:
 [1];  [2];  [3];  [3]
  1. Physics Department, South Dakota School of Mines & Technology, Rapid City, SD 57701, USA
  2. Nanoscience and Nanoengineering Department, South Dakota School of Mines & Technology, Rapid City, SD 57701, USA
  3. Electrical Engineering Department, South Dakota State University, Brookings, SD 57007, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1198252
Grant/Contract Number:  
DOE DE-FG02-08ER64624
Resource Type:
Published Article
Journal Name:
Research Letters in Nanotechnology
Additional Journal Information:
Journal Name: Research Letters in Nanotechnology Journal Volume: 2009; Journal ID: ISSN 1687-6849
Publisher:
Hindawi Publishing Corporation
Country of Publication:
Country unknown/Code not available
Language:
English

Citation Formats

Johnson, J. C., Ahrenkiel, S. P., Dutta, P., and Bommisetty, V. R. Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO 2 Films. Country unknown/Code not available: N. p., 2009. Web. doi:10.1155/2009/280797.
Johnson, J. C., Ahrenkiel, S. P., Dutta, P., & Bommisetty, V. R. Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO 2 Films. Country unknown/Code not available. https://doi.org/10.1155/2009/280797
Johnson, J. C., Ahrenkiel, S. P., Dutta, P., and Bommisetty, V. R. Thu . "Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO 2 Films". Country unknown/Code not available. https://doi.org/10.1155/2009/280797.
@article{osti_1198252,
title = {Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO 2 Films},
author = {Johnson, J. C. and Ahrenkiel, S. P. and Dutta, P. and Bommisetty, V. R.},
abstractNote = {Amorphous TiO 2 thin films were radio frequency sputtered onto siliconmonoxide and carbon support films on molybdenum transmission electron microscope (TEM) grids and observed during in situ annealing in a TEM heating stage at 250 ∘ C. The evolution of crystallization is consistent with a classical model of homogeneous nucleation and isotropic grain growth. The two-dimensional grain morphology of the TEM foil allowed straightforward recognition of amorphous and crystallized regions of the films, for measurement of crystalline volume fraction and grain number density. By assuming that the kinetic parameters remain constant beyond the onset of crystallization, the final average grain size was computed, using an analytical extrapolation to the fully crystallized state. Electron diffraction reveals a predominance of the anatase crystallographic phase.},
doi = {10.1155/2009/280797},
journal = {Research Letters in Nanotechnology},
number = ,
volume = 2009,
place = {Country unknown/Code not available},
year = {Thu Jan 01 00:00:00 EST 2009},
month = {Thu Jan 01 00:00:00 EST 2009}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1155/2009/280797

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Works referenced in this record:

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