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Nitrogen ion implantation into SiO/sub 2/

Abstract

The authors have studied nitrogen ion implantation into SiO/sub 2/ deposited onto GaP. Here they discuss briefly the deposition technique and the results of measurements of the breakdown voltage, the optical reflectivity and the electron paramagnetic resonance (EPR) before and after implantation.
Authors:
Gupta, S C; Sharma, B L; Agashe, V V [1] 
  1. Solid State Physics Lab., Delhi (India)
Publication Date:
Feb 01, 1980
Product Type:
Journal Article
Reference Number:
AIX-11-553534; EDB-81-069090
Resource Relation:
Journal Name: Surf. Technol.; (Switzerland); Journal Volume: 10:2
Subject:
36 MATERIALS SCIENCE; SILICON OXIDES; ION IMPLANTATION; BREAKDOWN; CHEMICAL VAPOR DEPOSITION; ELECTRON SPIN RESONANCE; GALLIUM PHOSPHIDES; NITROGEN IONS; OPTICAL PROPERTIES; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL COATING; DEPOSITION; GALLIUM COMPOUNDS; IONS; MAGNETIC RESONANCE; OXIDES; OXYGEN COMPOUNDS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; RESONANCE; SILICON COMPOUNDS; SURFACE COATING; 360605* - Materials- Radiation Effects
OSTI ID:
6543669
Country of Origin:
Switzerland
Language:
English
Other Identifying Numbers:
Journal ID: CODEN: SUTED
Submitting Site:
INIS
Size:
Pages: 153-155
Announcement Date:
Oct 01, 1980

Citation Formats

Gupta, S C, Sharma, B L, and Agashe, V V. Nitrogen ion implantation into SiO/sub 2/. Switzerland: N. p., 1980. Web. doi:10.1016/0376-4583(80)90062-X.
Gupta, S C, Sharma, B L, & Agashe, V V. Nitrogen ion implantation into SiO/sub 2/. Switzerland. https://doi.org/10.1016/0376-4583(80)90062-X
Gupta, S C, Sharma, B L, and Agashe, V V. 1980. "Nitrogen ion implantation into SiO/sub 2/." Switzerland. https://doi.org/10.1016/0376-4583(80)90062-X.
@misc{etde_6543669,
title = {Nitrogen ion implantation into SiO/sub 2/}
author = {Gupta, S C, Sharma, B L, and Agashe, V V}
abstractNote = {The authors have studied nitrogen ion implantation into SiO/sub 2/ deposited onto GaP. Here they discuss briefly the deposition technique and the results of measurements of the breakdown voltage, the optical reflectivity and the electron paramagnetic resonance (EPR) before and after implantation.}
doi = {10.1016/0376-4583(80)90062-X}
journal = []
volume = {10:2}
journal type = {AC}
place = {Switzerland}
year = {1980}
month = {Feb}
}