Abstract
The elaboration of the {beta}-Si{sub 3}N{sub 4} phase by plasma enhanced chemical vapour deposition is obtained using a radio frequency parallel plate discharge in a SiH{sub 4} - NH{sub 3} mixture. Our interest was focused on a systematic analysis of NH{sub 3} and SiH{sub 4}-NH{sub 3} plasmas in order to establish the nitrogenated species reactivity in the silane presence. Optical Emission Spectroscopy measurements have permitted to study the ammonia dissociation products in two different reactors (capacitive and mixte excitation systems). For the same experimental conditions (pressure, electric power) the ratios of the emission intensities associated to NH(A) and NH{sub 2}(A) states seem to be strongly affected by the excitation mode. Laser Induced Fluorescence method was used to analyse the destruction processes of NH{sub 2}(A) state and to identify the partners nature in inelastic collisions. No resonance signal was detected and the induced signal was associated at NH(A) state. All signal disappears in silane presence and these results suggest the high reactivity of the NH{sub x} radicals. The influence of the experimental conditions in the creation of NH{sub 2} radicals was also pointed out by Optical Absorption Spectroscopy. (authors) 8 refs.; 8 figs.; 2 tabs.
Ion, L;
Marty-Dessus, D;
Held, B;
Monge, C
[1]
- Laboratoire d`Electronique des Gaz et des Plasmas, Universite de Pau, Pau, 64000 (France)
Citation Formats
Ion, L, Marty-Dessus, D, Held, B, and Monge, C.
Reaction processes in SiH{sub 4}-NH{sub 3} mixture used for a: SiH(N) deposition by plasma enhanced chemical vapour deposition.
Slovakia: N. p.,
1997.
Web.
Ion, L, Marty-Dessus, D, Held, B, & Monge, C.
Reaction processes in SiH{sub 4}-NH{sub 3} mixture used for a: SiH(N) deposition by plasma enhanced chemical vapour deposition.
Slovakia.
Ion, L, Marty-Dessus, D, Held, B, and Monge, C.
1997.
"Reaction processes in SiH{sub 4}-NH{sub 3} mixture used for a: SiH(N) deposition by plasma enhanced chemical vapour deposition."
Slovakia.
@misc{etde_335849,
title = {Reaction processes in SiH{sub 4}-NH{sub 3} mixture used for a: SiH(N) deposition by plasma enhanced chemical vapour deposition}
author = {Ion, L, Marty-Dessus, D, Held, B, and Monge, C}
abstractNote = {The elaboration of the {beta}-Si{sub 3}N{sub 4} phase by plasma enhanced chemical vapour deposition is obtained using a radio frequency parallel plate discharge in a SiH{sub 4} - NH{sub 3} mixture. Our interest was focused on a systematic analysis of NH{sub 3} and SiH{sub 4}-NH{sub 3} plasmas in order to establish the nitrogenated species reactivity in the silane presence. Optical Emission Spectroscopy measurements have permitted to study the ammonia dissociation products in two different reactors (capacitive and mixte excitation systems). For the same experimental conditions (pressure, electric power) the ratios of the emission intensities associated to NH(A) and NH{sub 2}(A) states seem to be strongly affected by the excitation mode. Laser Induced Fluorescence method was used to analyse the destruction processes of NH{sub 2}(A) state and to identify the partners nature in inelastic collisions. No resonance signal was detected and the induced signal was associated at NH(A) state. All signal disappears in silane presence and these results suggest the high reactivity of the NH{sub x} radicals. The influence of the experimental conditions in the creation of NH{sub 2} radicals was also pointed out by Optical Absorption Spectroscopy. (authors) 8 refs.; 8 figs.; 2 tabs.}
place = {Slovakia}
year = {1997}
month = {Dec}
}
title = {Reaction processes in SiH{sub 4}-NH{sub 3} mixture used for a: SiH(N) deposition by plasma enhanced chemical vapour deposition}
author = {Ion, L, Marty-Dessus, D, Held, B, and Monge, C}
abstractNote = {The elaboration of the {beta}-Si{sub 3}N{sub 4} phase by plasma enhanced chemical vapour deposition is obtained using a radio frequency parallel plate discharge in a SiH{sub 4} - NH{sub 3} mixture. Our interest was focused on a systematic analysis of NH{sub 3} and SiH{sub 4}-NH{sub 3} plasmas in order to establish the nitrogenated species reactivity in the silane presence. Optical Emission Spectroscopy measurements have permitted to study the ammonia dissociation products in two different reactors (capacitive and mixte excitation systems). For the same experimental conditions (pressure, electric power) the ratios of the emission intensities associated to NH(A) and NH{sub 2}(A) states seem to be strongly affected by the excitation mode. Laser Induced Fluorescence method was used to analyse the destruction processes of NH{sub 2}(A) state and to identify the partners nature in inelastic collisions. No resonance signal was detected and the induced signal was associated at NH(A) state. All signal disappears in silane presence and these results suggest the high reactivity of the NH{sub x} radicals. The influence of the experimental conditions in the creation of NH{sub 2} radicals was also pointed out by Optical Absorption Spectroscopy. (authors) 8 refs.; 8 figs.; 2 tabs.}
place = {Slovakia}
year = {1997}
month = {Dec}
}