Abstract
We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in{sup 2} using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in{sup 2}, which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.
Yang, Joel K W;
Huigao, Duan;
Hui, Hui Kim;
[1]
Yunjie, Chen;
Tianli, Huang;
Leong, Siang Huei;
[2]
Thiyagarajah, Naganivetha;
Ng, Vivian
[3]
- Institute of Materials Research and Engineering, A-STAR, 3 Research Link, 117602 (Singapore)
- Data Storage Institute, A-STAR, 5 Engineering Drive, 117608 (Singapore)
- Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, 117576 (Singapore)
Citation Formats
Yang, Joel K W, Huigao, Duan, Hui, Hui Kim, Yunjie, Chen, Tianli, Huang, Leong, Siang Huei, Thiyagarajah, Naganivetha, and Ng, Vivian.
Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in{sup 2}.
United Kingdom: N. p.,
2011.
Web.
doi:10.1088/0957-4484/22/38/385301.
Yang, Joel K W, Huigao, Duan, Hui, Hui Kim, Yunjie, Chen, Tianli, Huang, Leong, Siang Huei, Thiyagarajah, Naganivetha, & Ng, Vivian.
Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in{sup 2}.
United Kingdom.
https://doi.org/10.1088/0957-4484/22/38/385301
Yang, Joel K W, Huigao, Duan, Hui, Hui Kim, Yunjie, Chen, Tianli, Huang, Leong, Siang Huei, Thiyagarajah, Naganivetha, and Ng, Vivian.
2011.
"Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in{sup 2}."
United Kingdom.
https://doi.org/10.1088/0957-4484/22/38/385301.
@misc{etde_21548347,
title = {Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in{sup 2}}
author = {Yang, Joel K W, Huigao, Duan, Hui, Hui Kim, Yunjie, Chen, Tianli, Huang, Leong, Siang Huei, Thiyagarajah, Naganivetha, and Ng, Vivian}
abstractNote = {We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in{sup 2} using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in{sup 2}, which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.}
doi = {10.1088/0957-4484/22/38/385301}
journal = []
issue = {38}
volume = {22}
place = {United Kingdom}
year = {2011}
month = {Sep}
}
title = {Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in{sup 2}}
author = {Yang, Joel K W, Huigao, Duan, Hui, Hui Kim, Yunjie, Chen, Tianli, Huang, Leong, Siang Huei, Thiyagarajah, Naganivetha, and Ng, Vivian}
abstractNote = {We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in{sup 2} using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in{sup 2}, which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.}
doi = {10.1088/0957-4484/22/38/385301}
journal = []
issue = {38}
volume = {22}
place = {United Kingdom}
year = {2011}
month = {Sep}
}