Scattering apodizer for laser beams
Abstract
A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, such method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. In one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obscured by the gradually tapered apodizer pattern of scattering elements.
- Inventors:
-
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 865564
- Patent Number(s):
- 4537475
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- scattering; apodizer; laser; beams; method; disclosed; apodizing; beam; smooth; production; diffraction; peaks; due; optical; discontinuities; path; comprising; introduction; pattern; elements; reducing; peak; intensity; region; smoothly; tapering; boundaries; distribution; density; tapered; gradually; produce; gradients; effective; reduce; effects; otherwise; produced; selectively; blasting; surface; transparent; fine; abrasive; particles; multitude; minute; pits; embodiment; employed; overcome; patterns; multiple; element; crystal; array; harmonic; conversion; interstices; supporting; grid; obscured; method comprising; abrasive particles; laser beams; laser beam; diffraction pattern; peak intensity; multiple element; diffraction effects; harmonic conversion; crystal elements; comprising introduction; gradually tapered; diffraction effect; /359/
Citation Formats
Summers, Mark A, Hagen, Wilhelm F, and Boyd, Robert D. Scattering apodizer for laser beams. United States: N. p., 1985.
Web.
Summers, Mark A, Hagen, Wilhelm F, & Boyd, Robert D. Scattering apodizer for laser beams. United States.
Summers, Mark A, Hagen, Wilhelm F, and Boyd, Robert D. Tue .
"Scattering apodizer for laser beams". United States. https://www.osti.gov/servlets/purl/865564.
@article{osti_865564,
title = {Scattering apodizer for laser beams},
author = {Summers, Mark A and Hagen, Wilhelm F and Boyd, Robert D},
abstractNote = {A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, such method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. In one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obscured by the gradually tapered apodizer pattern of scattering elements.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 1985},
month = {Tue Jan 01 00:00:00 EST 1985}
}