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Title: Method of making compound semiconductor films and making related electronic devices

Abstract

A method of forming a compound film includes the steps of preparing a source material, depositing the source material on a base to form a precursor film, and heating the precursor film in a suitable atmosphere to form a film. The source material includes Group IB-IIIA alloy-containing particles having at least one Group IB-IIIA alloy phase, with Group IB-IIIA alloys constituting greater than about 50 molar percent of the Group IB elements and greater than about 50 molar percent of the Group IIIA elements in the source material. The film, then, includes a Group IB-IIIA-VIA compound. The molar ratio of Group IB to Group IIIA elements in the source material may be greater than about 0.80 and less than about 1.0, or substantially greater than 1.0, in which case this ratio in the compound film may be reduced to greater than about 0.80 and less than about 1.0. The source material may be prepared as an ink from particles in powder form. The alloy phase may include a dopant. Compound films including a Group IIB-IVA-VA compound or a Group IB-VA-VIA compound may be substituted using appropriate substitutions in the method. The method, also, is applicable to fabrication of solar cellsmore » and other electronic devices.

Inventors:
 [1];  [2];  [3];  [4];  [5]
  1. Manhattan Beach, CA
  2. Tarzana, CA
  3. Northridge, CA
  4. Woodland Hills, CA
  5. Glendale, CA
Issue Date:
Research Org.:
International Solar Electric Technology, Inc. (Inglewood, CA)
OSTI Identifier:
872671
Patent Number(s):
5985691
Assignee:
International Solar Electric Technology, Inc. (Inglewood, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
DOE Contract Number:  
FG03-96ER82191
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; compound; semiconductor; films; related; electronic; devices; forming; film; steps; preparing; source; material; depositing; base; form; precursor; heating; suitable; atmosphere; ib-iiia; alloy-containing; particles; alloy; phase; alloys; constituting; 50; molar; percent; elements; iiia; ib-iiia-via; ratio; 80; substantially; reduced; prepared; powder; dopant; including; iib-iva-va; ib-va-via; substituted; appropriate; substitutions; applicable; fabrication; solar; cells; semiconductor film; precursor film; alloy phase; molar ratio; source material; solar cell; solar cells; compound semiconductor; electronic devices; compound film; powder form; molar percent; semiconductor films; containing particles; electronic device; related electronic; /438/

Citation Formats

Basol, Bulent M, Kapur, Vijay K, Halani, Arvind T, Leidholm, Craig R, and Roe, Robert A. Method of making compound semiconductor films and making related electronic devices. United States: N. p., 1999. Web.
Basol, Bulent M, Kapur, Vijay K, Halani, Arvind T, Leidholm, Craig R, & Roe, Robert A. Method of making compound semiconductor films and making related electronic devices. United States.
Basol, Bulent M, Kapur, Vijay K, Halani, Arvind T, Leidholm, Craig R, and Roe, Robert A. Fri . "Method of making compound semiconductor films and making related electronic devices". United States. https://www.osti.gov/servlets/purl/872671.
@article{osti_872671,
title = {Method of making compound semiconductor films and making related electronic devices},
author = {Basol, Bulent M and Kapur, Vijay K and Halani, Arvind T and Leidholm, Craig R and Roe, Robert A},
abstractNote = {A method of forming a compound film includes the steps of preparing a source material, depositing the source material on a base to form a precursor film, and heating the precursor film in a suitable atmosphere to form a film. The source material includes Group IB-IIIA alloy-containing particles having at least one Group IB-IIIA alloy phase, with Group IB-IIIA alloys constituting greater than about 50 molar percent of the Group IB elements and greater than about 50 molar percent of the Group IIIA elements in the source material. The film, then, includes a Group IB-IIIA-VIA compound. The molar ratio of Group IB to Group IIIA elements in the source material may be greater than about 0.80 and less than about 1.0, or substantially greater than 1.0, in which case this ratio in the compound film may be reduced to greater than about 0.80 and less than about 1.0. The source material may be prepared as an ink from particles in powder form. The alloy phase may include a dopant. Compound films including a Group IIB-IVA-VA compound or a Group IB-VA-VIA compound may be substituted using appropriate substitutions in the method. The method, also, is applicable to fabrication of solar cells and other electronic devices.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1999},
month = {Fri Jan 01 00:00:00 EST 1999}
}

Works referenced in this record:

Thin-film solar cells
journal, January 1995


Screen Printing of CIS Films for CIS-CdS Solar Cells
book, January 1991


CuInSe/sub 2/ films prepared by screen-printing and sintering method
conference, January 1988


Studies on CuIn precursor for the preparation of CuInSe2 thin films by the selenization technique
journal, February 1994


Characterization of co-sputtered Cu-In alloy precursors for CuInSe2 thin films fabrication by close-spaced selenization
journal, August 1998


CuInSe/sub 2/ thin film solar cells by pulsed laser deposition
conference, January 1993


Flexible and light weight copper indium diselenide solar cells on polyimide substrates
journal, August 1996