Ion source based on the cathodic arc
Abstract
A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.
- Inventors:
-
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 869141
- Patent Number(s):
- 5282944
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- source; based; cathodic; cylindrically; symmetric; produce; leave; surface; target; radially; reflected; electrostatic; fields; coated; array; electrically; isolated; rings; positioned; serves; dual; purpose; minimizing; bouncing; macroparticles; providing; electrical; insulation; maximize; electric; field; gradients; series; baffles; function; filtering; trapping; mechanism; field gradient; field gradients; electrically isolated; electric field; electrical insulation; electrostatic field; providing electrical; electrically isolate; rings positioned; electrostatic fields; cylindrically symmetric; static fields; /204/250/313/427/
Citation Formats
Sanders, David M, and Falabella, Steven. Ion source based on the cathodic arc. United States: N. p., 1994.
Web.
Sanders, David M, & Falabella, Steven. Ion source based on the cathodic arc. United States.
Sanders, David M, and Falabella, Steven. Sat .
"Ion source based on the cathodic arc". United States. https://www.osti.gov/servlets/purl/869141.
@article{osti_869141,
title = {Ion source based on the cathodic arc},
author = {Sanders, David M and Falabella, Steven},
abstractNote = {A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}
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Works referenced in this record:
Coating technology based on the vacuum arc-a review
journal, January 1990
- Sanders, D. M.; Boercker, D. B.; Falabella, S.
- IEEE Transactions on Plasma Science, Vol. 18, Issue 6
Review of ion‐based coating processes derived from the cathodic arc
journal, May 1989
- Sanders, David M.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 7, Issue 3
Comparison of two filtered cathodic arc sources
journal, March 1992
- Falabella, S.; Sanders, D. M.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 10, Issue 2