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Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Abstract

A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
335458
Patent Number(s):
5877229
Application Number:
PAN: 8-507,569; TRN: 99:004583
Assignee:
Lockheed Martin Energy Systems, Inc., Oak Ridge, TN (United States)
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 2 Mar 1999
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCE TECHNOLOGY; 36 MATERIALS SCIENCE; EPOXIDES; RESINS; RADIATION CURING; ELECTRON BEAMS; CROSS-LINKING

Citation Formats

Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, and Moulton, R J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators. United States: N. p., 1999. Web.
Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, & Moulton, R J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators. United States.
Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, and Moulton, R J. Tue . "High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators". United States.
@article{osti_335458,
title = {High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators},
author = {Janke, C J and Lopata, V J and Havens, S J and Dorsey, G F and Moulton, R J},
abstractNote = {A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {3}
}

Works referenced in this record:

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
journal, April 1990


The electron beam-induced cationic polymerization of epoxy resins
journal, January 1992


Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate
journal, April 1991


Electron-beam-induced polymerization of epoxides
journal, April 1991


New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists
journal, April 1991


Electron beam curing of bisphenol A epoxy resins. [ビスフェノールA型エポキシ樹脂の電子線硬化]
journal, January 1987


Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography
journal, November 1989


Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist
journal, November 1992