High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Janke, C J; Lopata, V J; Havens, S J; Dorsey, G F; Moulton, R J

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Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Abstract

A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.

Inventors:: Janke, C J; Lopata, V J; Havens, S J; Dorsey, G F; Moulton, R J

Issue Date:: Tue Mar 02 00:00:00 EST 1999

Research Org.:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Org.:: USDOE, Washington, DC (United States)

OSTI Identifier:: 335458

Patent Number(s):: 5877229

Application Number:: PAN: 8-507,569; TRN: 99:004583

Assignee:: Lockheed Martin Energy Systems, Inc., Oak Ridge, TN (United States)

DOE Contract Number:: AC05-84OR21400

Resource Type:: Patent

Resource Relation:: Other Information: PBD: 2 Mar 1999

Country of Publication:: United States

Language:: English

Subject:: 07 ISOTOPE AND RADIATION SOURCE TECHNOLOGY; 36 MATERIALS SCIENCE; EPOXIDES; RESINS; RADIATION CURING; ELECTRON BEAMS; CROSS-LINKING

Citation Formats


                    Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, and Moulton, R J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators.  United States: N. p., 1999. 
        Web.

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                    Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, & Moulton, R J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators.  United States.

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                    Janke, C J, Lopata, V J, Havens, S J, Dorsey, G F, and Moulton, R J. Tue .  
        "High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators".  United States.

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@article{osti_335458,

  title        = {High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators},

  author       = {Janke, C J and Lopata, V J and Havens, S J and Dorsey, G F and Moulton, R J},

  abstractNote = {A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Mar 02 00:00:00 EST 1999},

  month        = {Tue Mar 02 00:00:00 EST 1999}

}

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Works referenced in this record:

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
journal, April 1990

Hatzakis, Michael; Stewart, Kevin J.; Shaw, Jane M.
Microelectronic Engineering, Vol. 11, Issue 1-4
https://doi.org/10.1016/0167-9317(90)90156-N

High-Energy-Radiation-Induced Cationic Polymerization of Vinyl Ethers in the Presence of Onium Salt Initiators
book, December 1990

Sundell, Per-Erik; Jönsson, Sonny; Hult, Anders
ACS Symposium Series
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The electron beam-induced cationic polymerization of epoxy resins
journal, January 1992

Crivello, James V.; Fan, Mingxin; Bi, Daoshen
Journal of Applied Polymer Science, Vol. 44, Issue 1
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Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate
journal, April 1991

Batten, Richard J.; Davidson, R. Stephen; Wilkinson, Susan A.
Journal of Photochemistry and Photobiology A: Chemistry, Vol. 58, Issue 1
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Electron-beam-induced polymerization of epoxides
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Stephen Davidson, R.; Wilkinson, Susan A.
Journal of Photochemistry and Photobiology A: Chemistry, Vol. 58, Issue 1
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New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists
journal, April 1991

Hatzakis, M.; Stewart, K. J.; Shaw, J. M.
Journal of The Electrochemical Society, Vol. 138, Issue 4
https://doi.org/10.1149/1.2085718

Electron beam curing of bisphenol A epoxy resins. [ビスフェノールＡ型エポキシ樹脂の電子線硬化]
journal, January 1987

Okada, Toshio; Asano, Tsutomu; Hatada, Motoyoshi
KOBUNSHI RONBUNSHU, Vol. 44, Issue 10
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Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography
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Stewart, K. J.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6
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Photo- and thermoinitiated curing of epoxy resins by sulfonium salts
journal, July 1993

Stapp, Bernhard; Schön, Lothar; Bayer, Heiner
Angewandte Makromolekulare Chemie, Vol. 209, Issue 1, p. 197-212
https://doi.org/10.1002/apmc.1993.052090118

Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist
journal, November 1992

Glezos, N.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 10, Issue 6
https://doi.org/10.1116/1.586335

Plasticization and antiplasticization effects of sulphonium salt initiator fragments remaining in cycloaliphatic epoxy resins cured by electron beam and ultraviolet irradiation
journal, January 1992

Udagawa, Atsushi; Yamamoto, Yasuhiko; Inoue, Yoshio
Polymer, Vol. 33, Issue 2
https://doi.org/10.1016/0032-3861(92)90983-4

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Similar Records

Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Abstract

Citation Formats

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists journal, April 1990

High-Energy-Radiation-Induced Cationic Polymerization of Vinyl Ethers in the Presence of Onium Salt Initiators book, December 1990

The electron beam-induced cationic polymerization of epoxy resins journal, January 1992

Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate journal, April 1991

Electron-beam-induced polymerization of epoxides journal, April 1991

New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists journal, April 1991

Electron beam curing of bisphenol A epoxy resins. [ビスフェノールＡ型エポキシ樹脂の電子線硬化] journal, January 1987

Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography journal, November 1989

Photo- and thermoinitiated curing of epoxy resins by sulfonium salts journal, July 1993

Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist journal, November 1992

Plasticization and antiplasticization effects of sulphonium salt initiator fragments remaining in cycloaliphatic epoxy resins cured by electron beam and ultraviolet irradiation journal, January 1992

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
journal, April 1990

High-Energy-Radiation-Induced Cationic Polymerization of Vinyl Ethers in the Presence of Onium Salt Initiators
book, December 1990

The electron beam-induced cationic polymerization of epoxy resins
journal, January 1992

Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate
journal, April 1991

Electron-beam-induced polymerization of epoxides
journal, April 1991

New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists
journal, April 1991

Electron beam curing of bisphenol A epoxy resins. [ビスフェノールＡ型エポキシ樹脂の電子線硬化]
journal, January 1987

Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography
journal, November 1989

Photo- and thermoinitiated curing of epoxy resins by sulfonium salts
journal, July 1993

Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist
journal, November 1992

Plasticization and antiplasticization effects of sulphonium salt initiator fragments remaining in cycloaliphatic epoxy resins cured by electron beam and ultraviolet irradiation
journal, January 1992