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Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Abstract

A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.

Inventors:
 [1];  [2];  [3];  [4];  [5]
  1. Powell, TN
  2. Manitoba, CA
  3. Knoxville, TN
  4. Farragut, TN
  5. Lafayette, CA
Issue Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
OSTI Identifier:
872174
Patent Number(s):
5877229
Assignee:
Lockheed Martin Energy Systems, Inc. (Oak Ridge, TN)
Patent Classifications (CPCs):
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08L - COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08G - MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
energy; electron; beam; curing; epoxy; resin; systems; incorporating; cationic; photoinitiators; mixture; resins; semi-solid; triglycidyl; tris; hydroxyphenyl; methane; viscosity; bisphenol; glycidyl; photoinitiator; diaryliodonium; salt; cured; irradiating; dosage; beams; 50; 150; kgy; forming; cross-linked; polymer; cationic photoinitiators; electron beam; electron beams; energy electron; epoxy resin; epoxy resins; cross-linked epoxy; cationic photoinitiator; /522/

Citation Formats

Janke, Christopher J, Lopata, Vincent J, Havens, Stephen J, Dorsey, George F, and Moulton, Richard J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators. United States: N. p., 1999. Web.
Janke, Christopher J, Lopata, Vincent J, Havens, Stephen J, Dorsey, George F, & Moulton, Richard J. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators. United States.
Janke, Christopher J, Lopata, Vincent J, Havens, Stephen J, Dorsey, George F, and Moulton, Richard J. Fri . "High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators". United States. https://www.osti.gov/servlets/purl/872174.
@article{osti_872174,
title = {High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators},
author = {Janke, Christopher J and Lopata, Vincent J and Havens, Stephen J and Dorsey, George F and Moulton, Richard J},
abstractNote = {A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}

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Works referenced in this record:

The electron beam-induced cationic polymerization of epoxy resins
journal, January 1992


Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate
journal, April 1991


Electron-beam-induced polymerization of epoxides
journal, April 1991


New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists
journal, April 1991


Electron beam curing of bisphenol A epoxy resins. [ビスフェノールA型エポキシ樹脂の電子線硬化]
journal, January 1987


New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
journal, April 1990


Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography
journal, November 1989


Chemistry & technology of UV & EB formulation for coatings, Inks & paints. Vol. 5: Speciality finishes
journal, January 1995


Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist
journal, November 1992