High power, long focus electron source for beam processing
Abstract
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.
- Inventors:
- Issue Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531535
- Patent Number(s):
- 7250727
- Application Number:
- 11/143,417
- Assignee:
- UChicago Argonne, LLC (Chicago, IL)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- W-31-109-ENG-38
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2005-06-02
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS
Citation Formats
Lewellen, John W., and Noonan, John. High power, long focus electron source for beam processing. United States: N. p., 2007.
Web.
Lewellen, John W., & Noonan, John. High power, long focus electron source for beam processing. United States.
Lewellen, John W., and Noonan, John. Tue .
"High power, long focus electron source for beam processing". United States. https://www.osti.gov/servlets/purl/1531535.
@article{osti_1531535,
title = {High power, long focus electron source for beam processing},
author = {Lewellen, John W. and Noonan, John},
abstractNote = {Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {7}
}
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Works referencing / citing this record:
Field emission cathode gating for RF electron guns and planar focusing cathodes
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- Lewellen, John; Noonan, John
- US Patent Document 7,394,201