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Title: High power, long focus electron source for beam processing

Abstract

Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.

Inventors:
;
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531535
Patent Number(s):
7250727
Application Number:
11/143,417
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Patent
Resource Relation:
Patent File Date: 2005-06-02
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS

Citation Formats

Lewellen, John W., and Noonan, John. High power, long focus electron source for beam processing. United States: N. p., 2007. Web.
Lewellen, John W., & Noonan, John. High power, long focus electron source for beam processing. United States.
Lewellen, John W., and Noonan, John. Tue . "High power, long focus electron source for beam processing". United States. https://www.osti.gov/servlets/purl/1531535.
@article{osti_1531535,
title = {High power, long focus electron source for beam processing},
author = {Lewellen, John W. and Noonan, John},
abstractNote = {Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {7}
}

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Works referenced in this record:

Ribbon beam free electron laser
patent, December 1989


Electron beam measuring instrument
patent, October 1990


Particle beam accelerator, and a method of operation
patent, July 1998


Electron beam machining using rotating and shaped beam power distribution
patent, July 1996


Combined ion and molecular beam apparatus and method for depositing materials
patent, January 1989


Ion beam therapy system and a method for operating the system
patent, January 2004


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