Very low pressure high power impulse triggered magnetron sputtering
Abstract
A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1107788
- Patent Number(s):
- 8568572
- Application Number:
- 12/797,829
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC03-76SF00098; AC02-05CH11231
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Anders, Andre, and Andersson, Joakim. Very low pressure high power impulse triggered magnetron sputtering. United States: N. p., 2013.
Web.
Anders, Andre, & Andersson, Joakim. Very low pressure high power impulse triggered magnetron sputtering. United States.
Anders, Andre, and Andersson, Joakim. Tue .
"Very low pressure high power impulse triggered magnetron sputtering". United States. https://www.osti.gov/servlets/purl/1107788.
@article{osti_1107788,
title = {Very low pressure high power impulse triggered magnetron sputtering},
author = {Anders, Andre and Andersson, Joakim},
abstractNote = {A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 29 00:00:00 EDT 2013},
month = {Tue Oct 29 00:00:00 EDT 2013}
}
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Works referenced in this record:
Influence of high power densities on the composition of pulsed magnetron plasmas
journal, April 2002
- Ehiasarian, A. P.; New, R.; Münz, W. -D.
- Vacuum, Vol. 65, Issue 2
Method and apparatus for application of coatings on substrates
patent, October 1989
- Bergmann, Erich
- US Patent Document 4,877,505
Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review
journal, November 1999
- Anders, André
- Surface and Coatings Technology, Vol. 120-121
Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator
journal, January 2009
- Andersson, Joakim; Anders, André
- Physical Review Letters, Vol. 102, Issue 4
Fundamentals of pulsed plasmas for materials processing
journal, May 2004
- Anders, André
- Surface and Coatings Technology, Vol. 183, Issue 2-3
Efficient, compact power supply for repetitively pulsed, “triggerless” cathodic arcs
journal, December 1999
- Anders, André; MacGill, Robert A.; McVeigh, Thomas A.
- Review of Scientific Instruments, Vol. 70, Issue 12
Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering
journal, April 2009
- Anders, André; Yushkov, Georgy Yu.
- Journal of Applied Physics, Vol. 105, Issue 7
Physical vapor deposition dual coating process
patent, August 1993
- Randhawa, Harbhajan S.; Buske, Jeffrey
- US Patent Document 5,234,561
Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer
journal, May 2009
- Oks, Efim; Anders, André
- Journal of Applied Physics, Vol. 105, Issue 9
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
patent, June 2007
- Ruzic, David N.; Bristol, Robert L.; Rice, Bryan J.
- US Patent Document 7,230,258
Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
patent, December 1997
- Biberger, Maximilian A.; Conci, Dennis
- US Patent Document 5,702,573
Sustained self sputtering of different materials using dc magnetron
journal, August 1995
- Posadowski, Wm
- Vacuum, Vol. 46, Issue 8-10
Streaming metal plasma generation by vacuum arc plasma guns
journal, February 1998
- MacGill, R. A.; Dickinson, M. R.; Anders, A.
- Review of Scientific Instruments, Vol. 69, Issue 2
Hard laminated film, method of manufacturing the same and film-forming device
patent, August 2007
- Yamamoto, Kenji; Kujime, Susumu; Takahara, Kazuki
- US Patent Document 7,258,912