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Title: Method and apparatus for improved high power impulse magnetron sputtering

Abstract

A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

Inventors:
Issue Date:
Research Org.:
LBNL (Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States))
Sponsoring Org.:
USDOE
OSTI Identifier:
1107879
Patent Number(s):
8,574,410
Application Number:
12/989,378
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Anders, Andre. Method and apparatus for improved high power impulse magnetron sputtering. United States: N. p., 2013. Web.
Anders, Andre. Method and apparatus for improved high power impulse magnetron sputtering. United States.
Anders, Andre. Tue . "Method and apparatus for improved high power impulse magnetron sputtering". United States. https://www.osti.gov/servlets/purl/1107879.
@article{osti_1107879,
title = {Method and apparatus for improved high power impulse magnetron sputtering},
author = {Anders, Andre},
abstractNote = {A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {11}
}

Patent:

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