Plasma synthesis of nanoscaled Si{sub 3}N{sub 4}, SiC, and Si{sub 3}N{sub 4}-SiC composite powders
Conference
·
OSTI ID:99209
- Institut fuer Nichtmetallische Werkstoffe, Berlin (Germany)
The plasmachemical route is used for producing nanoscale powders of Si{sub 3}N{sub 4}, SiC and Si{sub 3}N{sub 4}-SiC composites from different methylated silanes. A great variety of chemical compositions as well as morphologies can be synthesized. In both the composite and SiC synthesis the crystalline component is mainly {beta}-SiC, but contrary to most gasphase reactions, {alpha}-SiC is also formed. Mean particle diameter and size distribution can be influenced by both the quenching rate and the reaction route. Plasrnachemical powder processing can be designed to attain multiple micro-structure-property objectives and consequently nanodisperse plasma powders can be tailored to the specific requirements for ceramic manufacturing.
- OSTI ID:
- 99209
- Report Number(s):
- CONF-940911--
- Country of Publication:
- United States
- Language:
- English
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