Surface state analysis of wet ground silicon nitride powders by x-ray photoelectron spectroscopy
Conference
·
OSTI ID:99203
- Tokyo Institute of Technology (Japan)
Three kinds of silicon nitride powders, i.e. as-prepared direct-nitridation powder, HF-treated direct-nitridation powder, and as-prepared imide decomposition powder, were wet ground by ball milling in water and the surface state change due to the grinding was examined by X-ray photoelectron spectroscopy (XPS) and X-ray Auger electron spectroscopy (XAES). The thickness of the oxidized surface layer of the powder was calculated from the peak area ratio and the chemical composition was evaluated from the Auger parameter (AP). Surface oxidized phase amount gradually increased with longer milling time and the thickness increased almost three times after 7 days milling, compared to as those of the unground samples. Chemical composition of the oxidized phase formed by the grinding was pure silica irrespective to the samples, although those of the oxidized phase in the unground samples differed among the samples.
- OSTI ID:
- 99203
- Report Number(s):
- CONF-940911--
- Country of Publication:
- United States
- Language:
- English
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