Applying uniform reversible strain to epitaxial oxide films

Journal Article · Thu Dec 31 23:00:00 EST 2009 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3374323· OSTI ID:989144

Biegalski, Michael D ^[1]; Dorr, Kathrin ^[2]; Kim, Dae Ho ^[3]; Christen, Hans M ^[1]

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1. ORNL
2. IFW Dresden
3. Tulane University

We demonstrate using four-circle x-ray diffraction that the piezoelectric substrate of Pb(Mg{sub 1/3}Nb{sub 2/3}){sub 0.72}Ti{sub 0.28}O{sub 3}(001) induces uniform reversible in-plane strain to epitaxially-grown oxide films and bilayers. The biaxial in-plane strain depends linearly on the applied electrical voltage. Utilizing the reversible strain, the strain-dependent lattice structure and the Poisson number characterizing the elastic response is determined for 200 nm thick SrTiO{sub 3}, LaScO{sub 3}, and BiFeO{sub 3} films. The uniformity and reversibility of the strain provides access to the direct quantitative measurement of strain-dependent properties of epitaxial oxide films.

• Research Organization: Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 989144
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 15 Vol. 96; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
OXIDES
STRAINS
SUBSTRATES
X-RAY DIFFRACTION