A Spectroscopic Comparison of Femtosecond Laser Modified Fused Silica using kHz and MHz Laser Systems.
Waveguides were written in fused silica using both a femtosecond fiber laser with a 1 MHz pulse repetition rate and a femtosecond amplified Ti:sapphire laser with a 1 kHz repetition rate. Confocal Raman and fluorescence microscopy were used to study structural changes in the waveguides written with both systems. A broad fluorescence band, centered at 650 nm, associated with non-bridging oxygen hole center (NBOHC) defects was observed after waveguide fabrication with the MHz laser. With the kHz laser system these defects were only observed for pulse energies above 1 {mu}J. Far fewer NBOHC defects were formed with the MHz laser than with kHz writing, possibly due to thermal annealing driven by heat accumulation effects at 1 MHz. When the kHz laser was used with pulse energies below 1 {mu}J, the predominant fluorescence was centered at 550 nm, a band assigned to the presence of silicon clusters (E{prime}{sub {delta}}). We also observed an increase in the intensity of the 605 cm{sup -1} Raman peak relative to the total Raman intensity, corresponding to an increase in the concentration of 3-membered rings in the lines fabricated with both laser systems.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 984936
- Report Number(s):
- UCRL-JRNL-215987; JAPIAU; TRN: US201016%%1677
- Journal Information:
- Journal of Applied Physics, Vol. 99, Issue 12; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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