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Strain-mediated metal-insulator transition in epitaxial ultra-thin films of NdNiO{sub 3}.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.3451462· OSTI ID:982691

We have synthesized epitaxial NdNiO3 ultrathin films in a layer-by-layer growth mode under tensile and compressive strain on SrTiO3 (001) and LaAlO3 (001), respectively. A combination of x-ray diffraction, temperature dependent resistivity, and soft x-ray absorption spectroscopy has been applied to elucidate electronic and structural properties of the samples. In contrast to the bulk NdNiO3, the metal-insulator transition under compressive strain is found to be completely quenched, while the transition remains under the tensile strain albeit modified from the bulk behavior.

Research Organization:
Argonne National Laboratory (ANL)
Sponsoring Organization:
SC
DOE Contract Number:
AC02-06CH11357
OSTI ID:
982691
Report Number(s):
ANL/XSD/JA-66841
Journal Information:
Appl. Phys. Lett., Journal Name: Appl. Phys. Lett. Journal Issue: Jun. 7, 2010 Vol. 96; ISSN 0003-6951
Country of Publication:
United States
Language:
ENGLISH

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