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Understanding deviations in lithographic patterns near interfaces : characterization of Antireflective Coatings (ARC) and the ARC / resist interface.

Journal Article · · Proposed for publication in Applied Surface Science.
OSTI ID:973676
 [1];  [2];  [1];  [2];  [1];  [2];  [1];
  1. National Institute of Standards and Technology Gaithersburg, MD
  2. Brewer Science, Inc
+ Show Author Affiliations

No abstract prepared.

Research Organization:
Sandia National Laboratories
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
973676
Report Number(s):
SAND2005-3371J
Journal Information:
Proposed for publication in Applied Surface Science., Journal Name: Proposed for publication in Applied Surface Science.
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
ANTIREFLECTION COATINGS
COATINGS
INTERFACES