5000 groove/mm multilayer-coated blazed grating with 33percent efficiency in the 3rd order in the EUV wavelength range
We report on recent progress in developing diffraction gratings which can potentially provide extremely high spectral resolution of 105-106 in the EUV and soft x-ray photon energy ranges. Such a grating was fabricated by deposition of a multilayer on a substrate which consists ofa 6-degree blazed grating with a high groove density. The fabrication of the substrate gratings was based on scanning interference lithography and anisotropic wet etch of silicon single crystals. The optimized fabrication process provided precise control of the grating periodicity, and the grating groove profile, together with very short anti-blazed facets, and near atomically smooth surface blazed facets. The blazed grating coated with 20 Mo/Si bilayers demonstrated a diffraction efficiency in the third order as high as 33percent at an incidence angle of 11? and wavelength of 14.18 nm.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 971087
- Report Number(s):
- LBNL-2275E
- Country of Publication:
- United States
- Language:
- English
Similar Records
A 10,000 groove/mm multilayer coated grating for EUV spectroscopy
High-efficiency 5000 lines/mm multilayer-coated blazed grating for EUV wavelengths
Related Subjects
DEPOSITION
DIFFRACTION
DIFFRACTION GRATINGS
EFFICIENCY
ENERGY RANGE
FABRICATION
INCIDENCE ANGLE
MONOCRYSTALS
OPTICS
PERIODICITY
PHOTONS
RESOLUTION
SILICON
SUBSTRATES
WAVELENGTHS
blazed grating
multilayer
EUV
soft x-rays
scanning interference lithography
anisotropic etch
microfabrication