At the limit of polychromatic microdiffraction
Journal Article
·
· Materials Science and Engineering
- ORNL
- Pohang Accelerator Laboratory, Pohang, Korea
- Argonne National Laboratory (ANL)
With a high-energy 3rd generation source like the Advanced Photon Source (APS), it is possible to push the performance of polychromatic microdiffraction far beyond current levels and to approach the intrinsic limit of the technique based on sample damage and the diffraction limit of X-rays. We describe ongoing efforts to improve the spatial, temporal and momentum transfer resolution of polychromatic microdiffraction on beamline 34-ID-E at the APS. The goal of this effort is to provide high-resolution images of 3D crystal structures over sufficient volumes and with sufficient detail to clarify the underlying physics of inhomogeneous structure and evolution on mesoscopic length scales. The performance of a high-speed amorphous Si area detector system and the ongoing development of advanced focusing optics will be described and discussed in light of the ultimate limits set by the physics of X-rays and materials, and in light of opportunities to field specialized insertion devices and optics for polychromatic microdiffraction.
- Research Organization:
- Oak Ridge National Laboratory (ORNL)
- Sponsoring Organization:
- SC USDOE - Office of Science (SC)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 966751
- Journal Information:
- Materials Science and Engineering, Journal Name: Materials Science and Engineering Journal Issue: 1-2 Vol. 524; ISSN MSCEAA; ISSN 0025-5416
- Country of Publication:
- United States
- Language:
- English
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