Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

Journal Article · Thu Jan 01 04:00:00 EST 2009 · Powder Technology

DOI:https://doi.org/10.1016/j.powtec.2008.04.083· OSTI ID:965299

Cadoret, L. ^[1]; Reuge, N ^[1]; Pannala, Sreekanth ^[2]; Syamlal, M ^[3]; Rossignol, C ^[1]; Dexpert-Ghys, J ^[1]; Coufort, C ^[1]; Caussat, B ^[1]

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1. CNRS, France
2. ORNL
3. National Energy Technology Laboratory (NETL)

Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro-fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4). Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consisted of agglomerates in millimetre range found near the distributor of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart's Group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders in order to achieve better predictability of the phenomena governing ultrafine particles.

• Research Organization: Oak Ridge National Laboratory (ORNL)
• Sponsoring Organization: FE USDOE - Office of Fossil Energy (FE); SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 965299
• Journal Information: Powder Technology, Journal Name: Powder Technology Journal Issue: 1-2 Vol. 190
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL VAPOR DEPOSITION
FLUIDIZED BEDS
HYDRODYNAMICS
SILANES
SILICON
TITANIUM OXIDES