Growth of Thick BaZrO3-doped YBa2Cu3O7-δ Films with High Critical Currents in High Applied Magnetic Fields
Conference
·
OSTI ID:961759
- ORNL
High quality, thick YBa2Cu3O7- (YBCO) films with splayed self-assembly of BaZrO3 insulating nanodot columns were epitaxially grown on short pieces of technically important textured metallic templates, ion-beam-assisted deposition (IBAD) MgO substrates by pulsed laser deposition. Variations in superconducting and microstructual properties are observed in the samples grown at different substrate temperatures of 790-810oC. At optimized substrate temperature ranges of 790 and 800oC, the samples were measured to have large self-field Ic of 670-787 A/cm at 77 K and minimum Ic of 353-392 A/cm with respect to all angles at 65 K, 3 T respectively.
- Research Organization:
- Oak Ridge National Laboratory (ORNL)
- Sponsoring Organization:
- OE USDOE - Office of Electric Transmission and Distribution
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 961759
- Country of Publication:
- United States
- Language:
- English
Similar Records
Strong Enhancement of Flux Pinning in YBa2Cu3O7-δ Multilayers with Columnar Defects Comprised of Self-Assembled BaZrO3
High current YBa[sub 2]Cu[sub 3]O[sub 7[minus][delta]] thick films on flexible nickel substrates with textured buffer layers
Interfacial reaction products and film orientation in YBa[sub 2]Cu[sub 3]O[sub 7[minus][ital x]] on zirconia substrates with and without CeO[sub 2] buffer layers
Journal Article
·
Sun Dec 31 23:00:00 EST 2006
· Superconductor Science & Technology
·
OSTI ID:931336
High current YBa[sub 2]Cu[sub 3]O[sub 7[minus][delta]] thick films on flexible nickel substrates with textured buffer layers
Journal Article
·
Mon Oct 10 00:00:00 EDT 1994
· Applied Physics Letters; (United States)
·
OSTI ID:7153786
Interfacial reaction products and film orientation in YBa[sub 2]Cu[sub 3]O[sub 7[minus][ital x]] on zirconia substrates with and without CeO[sub 2] buffer layers
Journal Article
·
Sun Oct 31 23:00:00 EST 1993
· Journal of Materials Research; (United States)
·
OSTI ID:5774660