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Title: Apparatus and method for removing solvent from carbon dioxide in resin recycling system

Patent ·
OSTI ID:959121

A two-step resin recycling system and method solvent that produces essentially contaminant-free synthetic resin material. The system and method includes one or more solvent wash vessels to expose resin particles to a solvent, the solvent contacting the resin particles in the one or more solvent wash vessels to substantially remove contaminants on the resin particles. A separator is provided to separate the solvent from the resin particles after removal from the one or more solvent wash vessels. The resin particles are next exposed to carbon dioxide in a closed loop carbon dioxide system. The closed loop system includes a carbon dioxide vessel where the carbon dioxide is exposed to the resin, substantially removing any residual solvent remaining on the resin particles after separation. A separation vessel is also provided to separate the solvent from the solvent laden carbon dioxide. Both the carbon dioxide and the solvent are reused after separation in the separation vessel.

Research Organization:
Kansas City Plant (KCP), Kansas City, MO (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-01AL66850
Assignee:
Honeywell Federal Manufacturing & Technologies, LLC (Kansas City, MO)
Patent Number(s):
7,473,759
Application Number:
11/733,590
OSTI ID:
959121
Country of Publication:
United States
Language:
English