Feature length-scale modeling of LPCVD & PECVD MEMS fabrication processes.
Journal Article
·
· Proposed for publication in the Journal of Microsystems Technologies.
OSTI ID:952804
- Reaction Design, Inc., San Diego, CA
The surface micromachining processes used to manufacture MEMS devices and integrated circuits transpire at such small length scales and are sufficiently complex that a theoretical analysis of them is particularly inviting. Under development at Sandia National Laboratories (SNL) is Chemically Induced Surface Evolution with Level Sets (ChISELS), a level-set based feature-scale modeler of such processes. The theoretical models used, a description of the software and some example results are presented here. The focus to date has been of low-pressure and plasma enhanced chemical vapor deposition (low-pressure chemical vapor deposition, LPCVD and PECVD) processes. Both are employed in SNLs SUMMiT V technology. Examples of step coverage of SiO{sub 2} into a trench by each of the LPCVD and PECVD process are presented.
- Research Organization:
- Sandia National Laboratories
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 952804
- Report Number(s):
- SAND2004-2898J
- Journal Information:
- Proposed for publication in the Journal of Microsystems Technologies., Journal Name: Proposed for publication in the Journal of Microsystems Technologies.
- Country of Publication:
- United States
- Language:
- English
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