Impact of thermal strain on the dielectric constant of sputtered barium strontium titanate thin films.
Barium strontium titanate thin films were deposited by sputtering on Pt/SiO{sub 2} structures using five different host substrates: magnesium oxide, strontium titanate, sapphire, silicon, and vycor glass. These substrates were chosen to provide a systematic change in thermal strain while maintaining the same film microstructure. All films have a weakly textured microstructure. Temperature dependent dielectric measurements from 100-500 K determined that decreasing thermal expansion coefficient of the host substrate (i.e., larger tensile thermal strain) reduced the film dielectric permittivity. The experimentally determined Curie-Weiss temperature decreased with increasing tensile thermal strain and the Curie-Weiss constant increased with tensile strain as predicted by Pertsev et al.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 949646
- Report Number(s):
- ANL/MSD/JA-42798; APPLAB; TRN: US201012%%429
- Journal Information:
- Appl. Phys. Lett., Vol. 80, Issue 11 ; Mar. 18, 2002; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- ENGLISH
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