A new approach to analysis of multilayer adsorption

Journal Article · Tue Aug 01 04:00:00 EDT 1995 · Journal of Colloid and Interface Science

DOI:https://doi.org/10.1006/jcis.1995.1353· OSTI ID:94373

Aranovich, G L; Donohue, M D ^[1]

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1. Johns Hopkins Univ., Baltimore, MD (United States). Dept. of Chemical Engineering

A new approach to the analysis of vapor adsorption on solids is proposed. In this method the adsorption isotherm is represented as a(p) = f(p)/(1-p/p{sub s}){sup d} where a(p) is the amount of vapor adsorbed, p is the pressure, p{sub s} is the saturation vapor pressure, f(p) is a function describing the adsorption in the first molecular layer, and d is an adjustable parameter. This model allows one to determine the specific surface area of disperse and porous materials in a way that is not limited by the functional form of the monolayer adsorption isotherm, f(p). In addition, this equation gives a new way to correlate adsorption data over the whole range of p/p{sub s}. Comparison is made with experimental data for the systems Ar-KCl, N{sub 2}-KCl, O{sub 2}-KCl, N{sub 2}-SiO{sub 2}, and N{sub 2}-Al{sub 2}O{sub 3}.

• DOE Contract Number: FG02-87ER13777
• OSTI ID: 94373
• Journal Information: Journal of Colloid and Interface Science, Journal Name: Journal of Colloid and Interface Science Journal Issue: 2 Vol. 173; ISSN 0021-9797; ISSN JCISA5
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
ADSORBENTS
ADSORPTION ISOTHERMS
ALUMINIUM OXIDES
ARGON
DATA ANALYSIS
NITROGEN
OXYGEN
POROUS MATERIALS
POTASSIUM CHLORIDES
SEPARATION PROCESSES
SILICON OXIDES
SURFACE AREA