Surface modification of Au/TiO2 catalysts by SiO2 via atomic layer deposition

Journal Article · Tue Jan 01 04:00:00 EST 2008 · Journal of Physical Chemistry

OSTI ID:941039

Ma, Zhen ^[1]; Brown, Suree ^[1]; Howe, Jane Y ^[1]; Dai, Sheng ^[1]

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1. ORNL

Atomic layer deposition (ALD) was utilized for the surface engineering of metallic nanoparticles to tame their sintering problems and catalytic activities. We chose the surface modification of gold nanocatalysts as an example to demonstrate the concept of this ALD-based approach. Herein, an active Au/TiO{sub 2} catalyst was modified by amorphous SiO{sub 2} via ALD, and the samples were characterized by inductively coupled plasma-optical emission spectrometry (ICP-OES), scanning (SEM-EDX) and transmission electron microscope-energy-dispersive X-ray spectrometry (TEM-EDX), X-ray diffraction (XRD), and thermogravimetry/differential thermogravimetry (TG/DTG), and the catalytic activities in CO oxidation and H{sub 2} oxidation were tested with respect to the pretreatment temperature and SiO{sub 2} content. A significant sintering resistance and changes in catalytic activities were observed. The difference between the SiO{sub 2}/Au/TiO{sub 2} samples prepared by gas-phase ALD and solution-phase chemical grafting was discussed.

• Research Organization: Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 941039
• Journal Information: Journal of Physical Chemistry, Journal Name: Journal of Physical Chemistry Journal Issue: 25 Vol. 112; ISSN JPCHAX; ISSN 0022-3654
• Country of Publication: United States
• Language: English