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Selective site occupancy exhibited by Cr{sup 3+} and Cr{sup 6+} incorporated into electrochemically deposited nickel hydroxide films.

Journal Article · · Electrochem. Solid State Lett.
DOI:https://doi.org/10.1149/1.1390771· OSTI ID:938396

We have utilized extended X-ray absorption fine structure (EXAFS) spectroscopy to investigate the site occupancy and local structure of Cr{sup 3+} and Cr{sup 6+} ions incorporated into electrodeposited alpha-Ni(OH){sub 2} films. The films were prepared by codeposition of Cr and Ni at constant cathodic current from aqueous solutions of nickel nitrate, and potassium chromate. EXAFS measurements show that in films produced from Ni{sup 2+} and Cr{sup 3+} solution, Cr{sup 3+} is incorporated into Ni lattice sites in alpha-Ni(OH)2. On the other hand, cathodic co deposition of Cr{sup 6+} and Ni{sup 2+} results in CrO{sub 4}{sup 2-} in interlamellar sites as well as sorbed on the surface of alpha-Ni(OH)2. These results are of significance in a number of technological areas, e.g., batteries, corrosion protection, environmental speciation, and remediation.

Research Organization:
Argonne National Laboratory (ANL)
DOE Contract Number:
AC02-06CH11357
OSTI ID:
938396
Report Number(s):
ANL/CMT/JA-30142
Journal Information:
Electrochem. Solid State Lett., Journal Name: Electrochem. Solid State Lett. Journal Issue: 4 ; 1999 Vol. 2; ISSN 1099-0062
Country of Publication:
United States
Language:
ENGLISH