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Local Epitaxy of YBa2Cu3Ox on Polycrystalline Ni Measured by X-ray Microdiffraction

Journal Article · · Journal of Materials Research
Polychromatic synchrotron x-ray microdiffraction is used to determine the epitaxy of YBa{sub 2}Cu{sub 3}O{sub x} (YBCO) films grown on polycrystalline Y{sub 0.15}Zr{sub 0.8}5O{sub 1.925}/CeO{sub 2}/Y{sub 2}O{sub 3}/Ni{sub 95}W{sub 5}(Ni) rolling-assisted, biaxially textured substrates (RABiTS). A novel analysis technique is introduced in which the orientation of mosaic films is measured by using a Hough transform to recognize arcs in Laue microdiffraction patterns that correspond to low-index zone axes. While the overall epitaxy is cube-on-cube, grain-by-grain analysis reveals a systematic misorientation of YBCO with respect to Ni: the YBCO (001) rotates toward the direction of the surface normal. The crystal mosaic (for rotation about the rolling direction) measured by a single diffraction pattern sampling a 0.5-{micro}m2 surface area is 0.7 degrees full width at half-maximum for YBCO grown on Ni grains with a low tilt; for more highly tilted grains, the YBCO patterns can no longer be measured, presumably due to the large mosaic. The YBCO mosaic over the entire area of a Ni grain is {approx}2.5 degrees and varies with grain size; the mosaic is smaller for larger grains.
Research Organization:
Oak Ridge National Laboratory (ORNL)
Sponsoring Organization:
SC USDOE - Office of Science (SC)
DOE Contract Number:
AC05-00OR22725
OSTI ID:
931459
Journal Information:
Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 3 Vol. 22; ISSN JMREEE; ISSN 0884-2914
Country of Publication:
United States
Language:
English