Interface mixing of Al/Fe and Fe/Al bilayer systems and the role of Ti as a stabilizing interlayer using Rutherford backscattering spectrometry and x-ray reflectometry

Journal Article · Tue Jan 01 04:00:00 EST 2008 · Journal of Applied Physics, 103(1):Art. No. 014508

DOI:https://doi.org/10.1063/1.2829803· OSTI ID:925713

Priyantha, Weerasinghe A; Chen, Hui; Kopczyk, M; Smith, Richard J; Kayani, Asghar N; Comouth, Andreas; Finsterbusch, M; Nachimuthu, Ponnusamy; Mccready, David E

Al/Fe and Fe/Al bilayer films with and without a Ti stabilizing interlayer at the interface have been grown on Si wafers using dc magnetron sputtering. X-ray reflectometry and Rutherford backscattering spectrometry were used to probe individual layer thicknesses and intermixing lengths. It is observed that the intermixing length is always higher when the Fe layer is on top of the Al layer. The samples with the Ti stabilizing layer, particularly when the Al layer is on top of the Fe, show that the Ti layer promotes the formation of abrupt interfaces.

• Research Organization: Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-76RL01830
• OSTI ID: 925713
• Report Number(s): PNNL-SA-58697; 19805; KP1704020
• Journal Information: Journal of Applied Physics, 103(1):Art. No. 014508, Journal Name: Journal of Applied Physics, 103(1):Art. No. 014508 Journal Issue: 1 Vol. 103; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
Environmental Molecular Sciences Laboratory
INTERFACES
IRON
LAMELLAE
MIXING
STABILIZATION
TITANIUM