At the limit of nondispersive micro and nanofocusing mirror optics.

Conference · Thu Jan 01 04:00:00 EST 2004

OSTI ID:925172

Ice, G E; Specht, E D; Tischler, J Z; Khounsary, A; Assoufid, L; Liu, C; ORNL,

We describe x-ray Kirkpatrick-Baez mirror designs with the potential to produce hard x-ray beams of 40 nm or smaller. The x-ray quality mirrors required to achieve the desired performance can be fabricated by differential deposition on ultra-smooth surfaces, or by differential polishing. Various mirror systems designed for nanofocusing to {approx}40 nm and below are compared. The performance limits of total-external-reflection mirrors are compared with the limits of multilayer mirrors that can potentially focus to an even smaller spot size. The advantages of side-by-side Kirkpatrick-Baez mirrors are evaluated and more advanced, four-mirror systems with significantly greater geometrical demagnification are discussed. These systems can potentially reach 5 - 20 nm focal spot sizes for multilayer and total-external-reflection optics respectively.

• Research Organization: Argonne National Laboratory (ANL)
• Sponsoring Organization: SC
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 925172
• Report Number(s): ANL/XFD/CP-113905
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

42 ENGINEERING
DEPOSITION
HARD X RADIATION
LIMITING VALUES
MIRRORS
OPTICS
PERFORMANCE
POLISHING