Filtered cathodic arc deposition with ion-species-selectivebias

Journal Article · Thu Oct 05 04:00:00 EDT 2006 · Review of Scientific Instruments

OSTI ID:919385

Anders, Andre; Pasaja, Nitisak; Sansongsiri, Sakon; Lim, SunnieH N

A dual-cathode arc plasma source was combined with acomputer-controlled bias amplifier such as to synchronize substrate biaswith the pulsed production of plasma. In this way, bias can be applied ina material-selective way. The principle has been applied to the synthesismetal-doped diamond-like carbon films, where the bias was applied andadjusted when the carbon plasma was condensing, and the substrate was atground when the metal was incorporated. In doing so, excessive sputteringby too-energetic metal ions can be avoided while the sp3/sp2 ratio can beadjusted. It is shown that the resistivity of the film can be tuned bythis species-selective bias. The principle can be extended tomultiple-material plasma sources and complex materials

• Research Organization: Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
• Sponsoring Organization: USDOE Director, Office of Science; Industry
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 919385
• Report Number(s): LBNL--61733; BnR: 600301010
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Vol. 78; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
AMPLIFIERS
CARBON
DEPOSITION
PLASMA
PRODUCTION
SPUTTERING
SUBSTRATES
SYNTHESIS
filtered cathodic arc bias