Adsorption and Reaction of Formaldehyde on Thin-film Cerium Oxide

Journal Article · Sun Jan 01 04:00:00 EST 2006 · Surf. Sci.

DOI:https://doi.org/10.1016/j.susc.2006.02.009· OSTI ID:913979

Zhou, J; Mullins, D

Formaldehyde adsorption and reaction have been studied on cerium oxide thin films that were vapor deposited on Ru(0 0 0 1). The formaldehyde behavior was examined as a function of temperature, exposure and Ce oxidation state. Formaldehyde chemisorbs on fully oxidized CeO{sub 2} as dioxymethylene, CH{sub 2}O{sub 2}. The dioxymethylene decomposes and desorbs as formaldehyde between 200 K and 400 K. No other products are formed. On reduced ceria, formaldehyde also adsorbs as dioxymethylene. In addition to the formaldehyde desorption between 200 K and 400 K, a more strongly bound form of dioxymethylene is formed that produces formaldehyde at 440 K. Above 400 K, some of the dioxymethylene reacts to form formate and methoxy on the surface. These species decompose to produce H{sub 2}, CO and CH{sub 2}O above 500 K.

• Research Organization: Brookhaven National Laboratory (BNL) National Synchrotron Light Source
• Sponsoring Organization: Doe - Office Of Science
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 913979
• Report Number(s): BNL--78547-2007-JA
• Journal Information: Surf. Sci., Journal Name: Surf. Sci. Vol. 600; ISSN SUSCAS; ISSN 0039-6028
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADSORPTION
CERIUM OXIDES
DESORPTION
FORMALDEHYDE
FORMATES
NSLS
THIN FILMS
national synchrotron light source