Adsorption of CO and C2H4 and Rh-loaded Thin-film Dysprosium Oxide

Journal Article · Sun Jan 01 04:00:00 EST 2006 · Surf. Sci.

DOI:https://doi.org/10.1016/j.susc.2006.04.037· OSTI ID:913976

Mullins, D

A dysprosium oxide thin film was deposited on Ru(0 0 0 1) by vapor depositing Dy in 2 x 10-7 torr O{sub 2} while the Ru was at 700 K. The film was ca. 5 nm thick and produced a p(1.4 x 1.4) LEED pattern relative to the Ru(0 0 0 1) substrate. The adsorption and reaction of CO and C{sub 2}H{sub 4} adsorbed on Rh supported on the Dy{sub 2}O{sub 3} film were studied by TPD and SXPS. The CO initially reacted with loosely bound oxygen in the substrate to produce CO{sub 2}. After the loosely bound oxygen was removed, the CO adsorbed non-dissociatively in a manner similar to what is seen on Rh(1 1 1). C{sub 2}H{sub 4} adsorbed on the Rh particles and underwent progressive dehydrogenation to produce H{sub 2} during TPD. The C from the C{sub 2}H{sub 4} reacted with the O in Dy{sub 2}O{sub 3} to produce CO. CO dissociation on the Rh particles could be promoted by treating the Dy{sub 2}O{sub 3} with C{sub 2}H{sub 4} before CO exposure.

• Research Organization: Brookhaven National Laboratory (BNL) National Synchrotron Light Source
• Sponsoring Organization: Doe - Office Of Science
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 913976
• Report Number(s): BNL--78544-2007-JA
• Journal Information: Surf. Sci., Journal Name: Surf. Sci. Journal Issue: 13 Vol. 600; ISSN SUSCAS; ISSN 0039-6028
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADSORPTION
DEHYDROGENATION
DISSOCIATION
DYSPROSIUM OXIDES
NSLS
OXYGEN
SUBSTRATES
THIN FILMS
national synchrotron light source