Microstructure of sputtered epitaxial Ni{sub 0.80}Fe{sub 0.20}/Ni{sub x}Co{sub 1-x}O exchange coupled bilayers on {alpha}-Al{sub 2}O{sub 3} (0001)
Journal Article
·
· Journal of Electronic Materials
OSTI ID:91292
- Univ. of California, Berkeley, CA (United States)
- Univ. of California, La Jolla, CA (United States)
Epitaxial Ni{sub 0.80}Fe{sub 0.20}/Ni{sub x}Co{sub 1-x}O bilayers have been grown on {alpha}-Al{sub 2}O{sub 3} (0001) substrates by dc-sputtering. X-ray diffraction and transmission electron microscopy have been employed to characterize these exchange-coupled films. The x-ray diffraction spectrum shows only the (111) family of peaks in both Ni{sub 0.80}Fe{sub 0.20} and Ni{sub x}Co{sub 1-x}O films. Growth orientation relationships have been determined from diffraction patterns taken in planar view and cross section. The relationships are: (111)Ni{sub 0.80}Fe{sub 0.20}//(111)Ni{sub x}Co{sub 1-x}O//(0001) {alpha}-Al{sub 2}O{sub 3} and [11]Ni{sub 0.80}Fe{sub 0.20}//[11] Ni{sub x}Co{sub 1-x}O//[1100]{alpha}-Al{sub 2}O{sub 3}. The microstructure of these films as well as the interfacial structure between Ni{sub 0.80}Fe{sub 0.20} and Ni{sub x}Co{sub 1-x}O have been analyzed in high resolution electron microscopy and are described in this paper. In addition, the dependence of the exchange coupling field on interfacial roughness is discussed. 10 refs., 7 figs.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 91292
- Report Number(s):
- CONF-940204--; CNN: Grant DMR-90-10908
- Journal Information:
- Journal of Electronic Materials, Journal Name: Journal of Electronic Materials Journal Issue: 10 Vol. 23; ISSN JECMA5; ISSN 0361-5235
- Country of Publication:
- United States
- Language:
- English
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