Growth of Strained Epitaxial Cu Films on Ru(0001) Monitored by Surface X-Ray Diffraction
Conference
·
OSTI ID:9084
- ORNL
The growth of Cu Layers deposited on Ru(0001) substrates at temperatures between 500 K and 850 K was studied using surface x-ray diffraction. Results are consistent with a Stransky-Krastanov growth mode with a two layer critical thickness.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN
- Sponsoring Organization:
- USDOE Office of Science
- DOE Contract Number:
- AC05-96OR22464
- OSTI ID:
- 9084
- Report Number(s):
- ORNL/CP-103381; KC 02 02 05 0; ON: DE00009084
- Country of Publication:
- United States
- Language:
- English
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