skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Transport of heavy-ion beams in 1 m free-standing plasmachannel

Abstract

No abstract prepared.

Authors:
; ; ; ;
Publication Date:
Research Org.:
COLLABORATION - Technische U.Darmstadt/Germany
Sponsoring Org.:
USDOE
OSTI Identifier:
898938
Report Number(s):
LBNL-59864; HIFAN 1445
Journal ID: ISSN 0263-0346; LPBEDA; R&D Project: Z41003; BnR: AT5015031; TRN: US200706%%445
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Laser and Particle Beams; Journal Volume: 24; Related Information: Journal Publication Date: 2006
Country of Publication:
United States
Language:
English
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; PLASMA; TRANSPORT; HEAVY IONS; ION BEAMS

Citation Formats

Neff, S., Knobloch, R., Hoffmann, D.H.H., Tauschwitz, A., and Yu, S.S.. Transport of heavy-ion beams in 1 m free-standing plasmachannel. United States: N. p., 2006. Web. doi:10.1017/S0263034606060125.
Neff, S., Knobloch, R., Hoffmann, D.H.H., Tauschwitz, A., & Yu, S.S.. Transport of heavy-ion beams in 1 m free-standing plasmachannel. United States. doi:10.1017/S0263034606060125.
Neff, S., Knobloch, R., Hoffmann, D.H.H., Tauschwitz, A., and Yu, S.S.. Wed . "Transport of heavy-ion beams in 1 m free-standing plasmachannel". United States. doi:10.1017/S0263034606060125.
@article{osti_898938,
title = {Transport of heavy-ion beams in 1 m free-standing plasmachannel},
author = {Neff, S. and Knobloch, R. and Hoffmann, D.H.H. and Tauschwitz, A. and Yu, S.S.},
abstractNote = {No abstract prepared.},
doi = {10.1017/S0263034606060125},
journal = {Laser and Particle Beams},
number = ,
volume = 24,
place = {United States},
year = {Wed Apr 12 00:00:00 EDT 2006},
month = {Wed Apr 12 00:00:00 EDT 2006}
}
  • No abstract prepared.
  • The reactions induced by rapid thermal annealing in free-standing amorphous (a) Si/M/a-Si (M = Ti, V, Cr, and Co) layered films deposited directly on electron microscope grids were studied with transmission electron diffraction. Stacks with ten different Si/M thickness ratios were simultaneously pulse heated by cw radiation from tungsten halogen lamps, and the sequence of phase formation determined from diffraction patterns after various annealing times. Solid-phase amorphization or glass formation occurs in Ti-Si and V-Si reactions but not in Co-Si and Cr-Si. Following amorphization in Ti-Si and V-Si, two new chemical environments are formed at the glass/Si and glass/metal interfacesmore » and found to facilitate nucleation of Si-rich and metal-rich silicides, respectively. These silicides have different nucleation kinetics. For example, in films with Ti/glass/Si, i.e., where excess Ti and Si are still available, the first silicide detected is Ti-rich, probably Ti/sub 5/Si/sub 3/, followed by C49 TiSi/sub 2/. In the nonglass forming Co-Si and Cr-Si systems, a single, unique silicide (CoSi and CrSi/sub 2/, respectively), nucleates at the M/Si interface, independent of stoichiometry.« less
  • Application of the space charge law to ion beam formation using plasma ion sources as well as the results of previous experiments to verify this law are briefly discussed. By strictly observing the conditions under which this law may be applied, it is possible to verify the space charge law experimentally for a magnetic ion source with end extraction using the acceleration system of a laboratory isotope separator. The problems encountered in proving the space charge law show that caution must be exercised in applying the law, especially to ion beams from different types of ion sources, as the dischargemore » conditions under which the law holds must first be established for each type. (auth)« less
  • No abstract prepared.