193 nm photodissociation of thiophene Probed using synchrotronradiation

Journal Article · Tue Jun 01 00:00:00 EDT 1999 · Journal of Physical Chemistry A

OSTI ID:893720

Qi, Fei; Sorkhabi, Osman; Rizvi, Abbas H; Suits, Arthur G

The photodissociation dynamics of thiophene, c-C4H4S, havebeen studied at 193 nm using tunable synchrotron undulator radiation as auniversal product probe. Five primary dissociation channelshave beenobserved, and the translational energy distributions and photoionizationefficiency spectra have been recorded for all products. The evidencesuggests that dissociation occurs on the ground-state surface followinginternal conversion.

• Research Organization: Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
• Sponsoring Organization: USDOE Director, Office of Science
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 893720
• Report Number(s): LBNL--43495
• Journal Information: Journal of Physical Chemistry A, Journal Name: Journal of Physical Chemistry A Journal Issue: 42 Vol. 103
• Country of Publication: United States
• Language: English