Effects of Post-Deposition Annealing on the Material Characteristics of Ultrathin HfO (2) Films on Silicon
Journal Article
·
· J.Appl.Phys.97:023704,2005
OSTI ID:893307
No abstract prepared.
- Research Organization:
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-76SF00515
- OSTI ID:
- 893307
- Report Number(s):
- SLAC-REPRINT-2005-273; TRN: US200625%%527
- Journal Information:
- J.Appl.Phys.97:023704,2005, Journal Name: J.Appl.Phys.97:023704,2005
- Country of Publication:
- United States
- Language:
- English
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