Deposition of Photosensitive Hydrogenated Amorphous Silicon-Germanium Films with a Tantalum Hot Wire
No abstract prepared.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO.
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC36-99GO10337
- OSTI ID:
- 885108
- Journal Information:
- Thin Solid Films, Journal Name: Thin Solid Films Journal Issue: 1-22006; ISSN THSFAP; ISSN 0040-6090
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
14 SOLAR ENERGY
36 MATERIALS SCIENCE
AMORPHOUS SILICON-GERMANIUM FILMS
DEPOSITION
HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD)
MATERIALS
OPTICAL BANDGAP
PHOTO-TO-DARK CONDUCTIVITY RATIO
PHOTON ABSORPTION COEFFICIENT
PHOTOSENSITIVITY
SOLAR ENERGY
Silicon Materials and Devices
Solar Energy - Photovoltaics
TANTALUM
TAUC BANDGAP
36 MATERIALS SCIENCE
AMORPHOUS SILICON-GERMANIUM FILMS
DEPOSITION
HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD)
MATERIALS
OPTICAL BANDGAP
PHOTO-TO-DARK CONDUCTIVITY RATIO
PHOTON ABSORPTION COEFFICIENT
PHOTOSENSITIVITY
SOLAR ENERGY
Silicon Materials and Devices
Solar Energy - Photovoltaics
TANTALUM
TAUC BANDGAP