Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell
A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an air electrode structure of an electrochemical cell by (A) providing an electrode surface; (B) forming on a selected portion of the electrode surface, a layer of doped LaCrO{sub 3} particles doped with an element selected from Ca, Sr, Ba, Mg, Co, Ni, Al and mixtures thereof by plasma spraying doped LaCrO{sub 3} powder, preferably compensated with chromium as Cr{sub 2}O{sub 3} and/or dopant element, preferably by plasma arc spraying; and, (C) heating the doped and compensated LaCrO{sub 3} layer to about 1100 C to 1300 C to provide a dense, substantially gas-tight, substantially hydration-free, electrically conductive interconnection material bonded to the electrode surface. A solid electrolyte layer can be applied to the unselected portion of the air electrode, and a fuel electrode can be applied to the solid electrolyte, to provide an electrochemical cell. 6 figs.
- Research Organization:
- Westinghouse Electric Corporation
- DOE Contract Number:
- FC21-91MC28055
- Assignee:
- Westinghouse Electric Corp., Pittsburgh, PA (United States)
- Patent Number(s):
- US 5,426,003/A/
- Application Number:
- PAN: 8-195,774
- OSTI ID:
- 87717
- Resource Relation:
- Other Information: PBD: 20 Jun 1995
- Country of Publication:
- United States
- Language:
- English
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